Upgrading of Edwards E306 and auto 306 vacuum deposition  coater systems. Multi-technique thin film vacuum deposition systems, incorporating sputtering, e-beam, thermal evaporation, OLED, plasma cleaning and film thickness monitors.

Upgrading of Edwards 306 and Auto 306 coaters. Upgrades include Minibox box chamber, sputtering, e-beam and thermal evaporation thin film deposition techniques, wafer plasma cleaning, in vacuum wafer heating, thin film monitoring and automated process control.

We can offer a range of upgrade options which are detailed below. Cost and ease of upgrading is dependant on the specification and layout of the Edwards 306 or Edwards auto 306 coater that is to be upgraded. Please cal us to discuss you requirements in greater detail.

	EBE-4 is a four hearth electron beam evaporator, water cooled and with 270º permanent magnet focusing. Options include beam sweep and solid state PSU with remote controller.
	TORUS sputter sources for DC and RF deposition. These sources from KJ Lesker are easy to retro-fit to most systems including the MiniLab ( max 4 sources) and our E306 MiniBox conversion ( max 3 sources).  If the Flexi-head version is fitted, the user is able to quickly adjust the geometry for different sample sizes and sample orbits. Other options include high field strength magnets
	TE-4 four hearth resistive (thermal) evaporation source. This little baby is a really neat solution to a lot of problems associated with multi-hearth sources. Firstly it has discrete power to  each filament which means that it can be configured for co-dep, secondly it has water cooled  shielding allowing it to be used as an entry level OLED source or compound metal / organic source as radiated heat doesn't transfer to the adjacent hearths. Cleaning is easy too as the shields are removable. Its also retro-fitable to most systems via the M8 base stud. Use your old power system or check out ours.....
	ME50 refractory wire electron beam evaporator - this all UHV compatible electron beam evaporator uses a wire as the anode which conveniently doubles up as the target material. The e-beam is fixed focus so the wire is moved relative to the beam via a linear retractor. By keeping the target mass down, the power requirement is very low, which in turn means that the cost of this component is very low.... in fact its probably the lowest priced electron beam evaporator and controller on the market today!
	RIE600 reactive ion etch component. Known to many users as the "EtchStik", this is a very simple and inexpensive component and is therefore ideal to retrofit to an existing sputter system. Located in a 1" base port and connected via a standard sputter "N" type cable, the device uses an RF supply to drive a 70mm o/d electrode to circa 1W/cm2   The RIE600 is height adjustable too.
	PG-Bar plasma sample cleaning bar. In an effort to reduce the real estate taken up by many sample cleaning plasma tools, we designed a simple horizontal etch electrode that can be swung from a pivot to position the etch facility at the most advantageous point - or out of the way if not in use. Simple to install, simple to operate and inexpensive, which is why we sell so many...
	AS3000V - is a sample cleaning / dry etch argon ion source designed for use in very clean and UHV systems. As the name suggests it achieves a maximum 3kV beam energy which can be varied by the user. The plasma is created in a discharge cell using electron impact from a hot filament and typical chamber pressures are of the order of 10-5mb when the source is in use.
	ARDK-8 sample rotation stage is designed for retro fit to the MiniLab and MiniBox chambers, but can also be readily adapted to Edwards E306 systems using the glass cylinder and top plate arrangement. The ARDK-8 consists of a sample platen, quick release boss, rotary feed through, drive coupling, motor with mounting stage, rotary dial variable speed controller ( 0-60 rpm) and PC interface option.
	BOC6 sample heating / bakeout  system. This very flexible little box of electronics has many uses from UHV system bake out control to internal quartz lamp heater control. It is a power supply controlled by a digital timer with a digital programmable temperature controller allowing 2 x 2 zone differential outputs. The BOC6 also allows slave units to be added should more power be required.
	Ceramic covered wafer heater. This cost effective versatile resistance heater powered by BOC6 power supply, can reach temperatures of up to 800 C and operate in UHV or with oxygen present. It can be mounted in the base of the chamber or behind the substrate in a rotating hot stage.
	MiniBox E306 chamber retrofit - turn your old E306 into a multi-technique box coater with this chamber conversion. Unlike the FL400 from Edwards which has a radius back, this little box is square, enabling it to get away from the problems associated with the radial ports and real estate geometry. If you've ever tried putting more than one technique into an Edwards coater, then you will already know that this is the way to do it. We've had 16 thermal sources in this chamber with 4 operating simultaneously!! Eat that Mr Edwards!
	Other retrofit chamber options - Apart from our full custom chambers and associated fast entry systems, we also offer Edwards compatible glass wear and top plates designed to accept the Moorfield and Edwards accessories.  Check it out! If you require anything special, we can quote for chambers up to 1 mtr in diameter.
	Thin film monitoring and control systems - We represent the Sigma range of thin film monitors and thin film controllers. These are excellent value professional products that compete with the industry established IC5 and Intellemetrics  kit. Sigma are rapidly becoming the new alternative. Call for a demo...
	Automatic process control - We can offer automatic process control and data acquisition upgrades with the use of a Sigma SQM242 card and software fitted to a PC.

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Disclaimer: The E306.CO.UK website is a totally independent site and is in no way affiliated with or connected to the BOC Edwards company who are the original manufacturers of the 306 thin film deposition system.